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| Subject Code | Subject Title | Academic Year | Term | Examination Session |
|---|---|---|---|---|
| 42620 | IC Engineering | 1996 / 1997 | First | Examination |
| 42620 | IC Engineering | 1996 / 1997 | First | Re-examination |
| 42620 | IC Engineering | 1997 / 1998 | First | Examination |
| 42620 | IC Engineering | 1995 / 1996 | First | Examination |
| 42620 | IC Engineering | 1999 / 2000 | First | Examination |
| 42620 | IC Engineering | 1997 / 1998 | First | Examination |
| 42620 | IC Engineering | 1998 / 1999 | First | Examination |
| 42620 | IC Engineering | 1999 / 2000 | First | Examination |
| 42620 | IC Engineering | 1998 / 1999 | First | Examination |
| 42620 | IC Engineering | 1995 / 1996 | First | Examination |
| 42620 | IC Engineering | 1996 / 1997 | First | Examination |
| EIE306 | IC Technology and Processes | 2005 / 2006 | Second | Examination |
| EIE306 | IC Technology and Processes | 2004 / 2005 | Second | Re-examination |
| EIE306 | IC Technology and Processes | 2004 / 2005 | Second | Examination |
| EIE306 | IC Technology and Processes | 2006 / 2007 | First | Examination |
| EIE306 | IC Technology and Processes | 2007 / 2008 | First | Examination |
| EIE306 | IC Technology and Processes | 2009 / 2010 | First | Examination |
| EIE306 | IC Technology and Processes | 2010 / 2011 | First | Examination |
| EIE306 | IC Technology and Processes | 2008 / 2009 | First | Examination |
| EIE306 | IC Technology and Processes | 2011 / 2012 | First | Examination |